| 3D mask effects of absorber geometry in EUV lithography systems RR Haque, Z Levinson, BW Smith Extreme Ultraviolet (EUV) Lithography VII 9776, 117-124, 2016 | 9 | 2016 |
| Impact of pupil plane filtering on mask roughness transfer B Baylav, C Maloney, Z Levinson, J Bekaert, A Vaglio Pret, BW Smith Journal of Vacuum Science & Technology B 31 (6), 2013 | 9 | 2013 |
| Study of angular effects for optical systems into the EUV A Burbine, Z Levinson, A Schepis, BW Smith Extreme Ultraviolet (EUV) Lithography V 9048, 663-669, 2014 | 6 | 2014 |
| A method of image-based aberration metrology for EUVL tools Z Levinson, S Raghunathan, E Verduijn, O Wood II, P Mangat, K Goldberg, ... Extreme Ultraviolet (EUV) Lithography VI 9422, 354-365, 2015 | 4 | 2015 |
| Optimization of image-based aberration metrology for EUV lithography Z Levinson, G Fenger, A Burbine, AR Schepis, BW Smith Extreme Ultraviolet (EUV) Lithography V 9048, 655-662, 2014 | 4 | 2014 |
| High accuracy OPC modeling for new EUV low-K1 mask technology options E Sakr, R DeLancey, W Hoppe, Z Levinson, R Iwanow, R Chen, D Yang, ... DTCO and Computational Patterning II 12495, 124-134, 2023 | 3 | 2023 |
| Lithographic pattern formation in the presence of aberrations in anamorphic optical systems ZA Levinson, BW Smith Extreme Ultraviolet (EUV) Lithography XI 11323, 36-47, 2020 | 3 | 2020 |
| Impact of flare on source mask optimization in EUVL for 7nm technology node L Dong, R Chen, T Fan, R Zhao, Y Wei, J Jia, Z Levinson, T Dam, J Lee, ... Extreme Ultraviolet (EUV) Lithography XI 11323, 532-541, 2020 | 2 | 2020 |
| Image-based pupil plane characterization via principal component analysis for EUVL tools Z Levinson, A Burbine, E Verduijn, O Wood, P Mangat, KA Goldberg, ... Extreme Ultraviolet (EUV) Lithography VII 9776, 353-363, 2016 | 2 | 2016 |
| An automated image-based tool for pupil plane characterization of EUVL tools Z Levinson, JS Smith, G Fenger, BW Smith Extreme Ultraviolet (EUV) Lithography VII 9776, 692-697, 2016 | 2 | 2016 |
| Image-based pupil plane characterization via a space-domain basis Z Levinson, A Burbine, E Verduijn, O Wood, KA Goldberg, MP Benk, ... Journal of Micro/Nanolithography, MEMS, and MOEMS 16 (2), 023509-023509, 2017 | 1 | 2017 |
| Image-based pupil plane characterization for anamorphic lithography systems Z Levinson, BW Smith Extreme Ultraviolet (EUV) Lithography VIII 10143, 384-395, 2017 | 1 | 2017 |
| High accuracy electromagnetic full-chip modeling for curvilinear mask OPC and ILT E Sakr, Z Levinson, R DeLancey, CJ Lee, J Li, R Chen, R Iwanow, ... DTCO and Computational Patterning III 12954, 149-157, 2024 | | 2024 |
| Rapid image-based pupil plane characterization for EUV lithography systems Z Levinson, E Verduijn, T Brunner, O Wood, BW Smith International Conference on Extreme Ultraviolet Lithography 2018 10809, 118-128, 2018 | | 2018 |
| Alternative method for variable aspect ratio vias using a vortex mask AR Schepis, Z Levinson, A Burbine, BW Smith Optical Microlithography XXVII 9052, 452-459, 2014 | | 2014 |
| Mitigating mask roughness via pupil filtering B Baylav, C Maloney, Z Levinson, J Bekaert, AV Pret, B Smith Optical Microlithography XXVII 9052, 470-479, 2014 | | 2014 |
