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Bowen Li
Bowen Li
Verified email at lzu.edu.cn
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Year
Spectroscopy of highly charged ions and its relevance to EUV and soft x-ray source development
G O’Sullivan, B Li, R D’Arcy, P Dunne, P Hayden, D Kilbane, ...
Journal of Physics B: Atomic, Molecular and Optical Physics 48 (14), 144025, 2015
1202015
Feasibility study of broadband efficient “water window” source
T Higashiguchi, T Otsuka, N Yugami, W Jiang, A Endo, B Li, P Dunne, ...
Applied Physics Letters 100 (1), 2012
902012
Extreme ultraviolet source at 6.7 nm based on a low-density plasma
T Higashiguchi, T Otsuka, N Yugami, W Jiang, A Endo, B Li, D Kilbane, ...
Applied Physics Letters 99 (19), 2011
822011
Optimizing conversion efficiency and reducing ion energy in a laser-produced Gd plasma
T Cummins, T Otsuka, N Yugami, W Jiang, A Endo, B Li, C O’Gorman, ...
Applied Physics Letters 100 (6), 2012
622012
Quasi-Moseley's law for strong narrow bandwidth soft x-ray sources containing higher charge-state ions
H Ohashi, T Higashiguchi, Y Suzuki, G Arai, Y Otani, T Yatagai, B Li, ...
Applied Physics Letters 104 (23), 2014
592014
Characteristics of extreme ultraviolet emission from mid-infrared laser-produced rare-earth Gd plasmas
T Higashiguchi, B Li, Y Suzuki, M Kawasaki, H Ohashi, S Torii, ...
Optics Express 21 (26), 31837-31845, 2013
562013
Gd plasma source modeling at 6.7 nm for future lithography
B Li, P Dunne, T Higashiguchi, T Otsuka, N Yugami, W Jiang, A Endo, ...
Applied Physics Letters 99 (23), 2011
392011
Investigation of Gd and Tb plasmas for beyond extreme ultraviolet lithography based on multilayer mirror performance
B Li, T Otsuka, T Higashiguchi, N Yugami, W Jiang, A Endo, P Dunne, ...
Applied Physics Letters 101 (1), 2012
352012
Sources for beyond extreme ultraviolet lithography and water window imaging
G O’Sullivan, B Li, P Dunne, P Hayden, D Kilbane, R Lokasani, E Long, ...
Physica Scripta 90 (5), 054002, 2015
342015
Dielectronic recombination of Rh-like Gd and W
BW Li, G O’Sullivan, YB Fu, CZ Dong
Physical Review A 85 (5), 052706, 2012
322012
Efficient extreme ultraviolet emission from one-dimensional spherical plasmas produced by multiple lasers
K Yoshida, S Fujioka, T Higashiguchi, T Ugomori, N Tanaka, H Ohashi, ...
Applied Physics Express 7 (8), 086202, 2014
312014
“Water window” sources: Selection based on the interplay of spectral properties and multilayer reflection bandwidth
B Li, T Higashiguchi, T Otsuka, W Jiang, A Endo, P Dunne, G O'Sullivan
Applied Physics Letters 102 (4), 2013
302013
Spectral investigation of highly ionized bismuth plasmas produced by subnanosecond Nd: YAG laser pulses
T Wu, T Higashiguchi, B Li, G Arai, H Hara, Y Kondo, T Miyazaki, TH Dinh, ...
Journal of Physics B: Atomic, Molecular and Optical Physics 49 (3), 035001, 2016
282016
Soft X-ray emission from molybdenum plasmas generated by dual laser pulses
R Lokasani, G Arai, Y Kondo, H Hara, TH Dinh, T Ejima, T Hatano, ...
Applied Physics Letters 109 (19), 2016
272016
Tuning extreme ultraviolet emission for optimum coupling with multilayer mirrors for future lithography through control of ionic charge states
H Ohashi, T Higashiguchi, B Li, Y Suzuki, M Kawasaki, T Kanehara, ...
Journal of Applied Physics 115 (3), 2014
262014
The effect of viewing angle on the spectral behavior of a Gd plasma source near 6.7 nm
C O’Gorman, T Otsuka, N Yugami, W Jiang, A Endo, B Li, T Cummins, ...
Applied Physics Letters 100 (14), 2012
242012
Relativistic R-matrix calculation photoionization cross section of Xe and Xe@ C60
B Li, G O'Sullivan, C Dong
Journal of Physics B: Atomic, Molecular and Optical Physics 46 (15), 155203, 2013
232013
XUV spectra of laser-produced zirconium plasmas
B Li, T Higashiguchi, T Otsuka, W Jiang, A Endo, P Dunne, G O'Sullivan
Journal of Physics B: Atomic, Molecular and Optical Physics 45 (24), 245004, 2012
202012
Fisher information for endohedrally confined hydrogen atom
L Wu, S Zhang, B Li
Physics Letters A 384 (1), 126033, 2020
182020
A 6.7-nm beyond EUV source as a future lithography source
T Otsuka, B Li, C O'Gorman, T Cummins, D Kilbane, T Higashiguchi, ...
Extreme Ultraviolet (EUV) Lithography III 8322, 342-351, 2012
182012
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