Nanoscale mapping of electrical resistivity and connectivity in graphene strips and networks PN Nirmalraj, T Lutz, S Kumar, GS Duesberg, JJ Boland Nano letters 11 (1), 16-22, 2011 | 206 | 2011 |
Large-scale parallel arrays of silicon nanowires via block copolymer directed self-assembly RA Farrell, NT Kinahan, S Hansel, KO Stuen, N Petkov, MT Shaw, ... Nanoscale 4 (10), 3228-3236, 2012 | 68 | 2012 |
Influence of crystal orientation and body doping on trigate transistor performance E Landgraf, W Rösner, M Städele, L Dreeskornfeld, J Hartwich, ... Solid-state electronics 50 (1), 38-43, 2006 | 57 | 2006 |
Gas phase controlled deposition of high quality large-area graphene films S Kumar, N McEvoy, T Lutz, GP Keeley, V Nicolosi, CP Murray, WJ Blau, ... Chemical communications 46 (9), 1422-1424, 2010 | 56 | 2010 |
Transparent ultrathin conducting carbon films M Schreiber, T Lutz, GP Keeley, S Kumar, M Boese, S Krishnamurthy, ... Applied surface science 256 (21), 6186-6190, 2010 | 45 | 2010 |
Fabrication of a sub-10 nm silicon nanowire based ethanol sensor using block copolymer lithography S Rasappa, D Borah, CC Faulkner, T Lutz, MT Shaw, JD Holmes, ... Nanotechnology 24 (6), 065503, 2013 | 41 | 2013 |
Free-Standing, Single-Crystal Cu3Si Nanowires SJ Jung, T Lutz, AP Bell, EK McCarthy, JJ Boland Crystal growth & design 12 (6), 3076-3081, 2012 | 32 | 2012 |
An investigation of the electrical properties of pyrolytic carbon in reduced dimensions: Vias and wires AP Graham, G Schindler, GS Duesberg, T Lutz, W Weber Journal of Applied Physics 107 (11), 2010 | 32 | 2010 |
Surface energy driven agglomeration and growth of single crystal metal wires SJ Jung, T Lutz, M Boese, JD Holmes, JJ Boland Nano letters 11 (3), 1294-1299, 2011 | 27 | 2011 |
Comparative study of calixarene and HSQ resist systems for the fabrication of sub-20 nm MOSFET device demonstrators J Kretz, L Dreeskornfeld, G Ilicali, T Lutz, W Weber Microelectronic engineering 78, 479-483, 2005 | 24 | 2005 |
A study on the initiation processes of white etching cracks (WECs) in AISI 52100 bearing steel J Spille, J Wranik, S Barteldes, J Mayer, A Schwedt, M Zürcher, T Lutz, ... Wear 477, 203864, 2021 | 21 | 2021 |
Multi-level p+ tri-gate SONOS NAND string arrays C Friederich, M Specht, T Lutz, F Hofmann, L Dreeskornfeld, W Weber, ... 2006 International Electron Devices Meeting, 1-4, 2006 | 18 | 2006 |
Resolving in situ specific‐contact, current‐crowding, and channel resistivity in nanowire devices: a case study with silver nanowires MM Koleśnik, S Hansel, T Lutz, N Kinahan, M Boese, V Krstić Small 7 (20), 2873-2877, 2011 | 16 | 2011 |
Contact resistivity and suppression of Fermi level pinning in side-contacted germanium nanowires MM Koleśnik-Gray, T Lutz, G Collins, S Biswas, JD Holmes, V Krstić Applied Physics Letters 103 (15), 2013 | 15 | 2013 |
Determination of best focus and optimum dose for variable shaped e-beam systems by applying the isofocal dose method K Keil, KH Choi, C Hohle, J Kretz, T Lutz, L Bettin, M Boettcher, ... Microelectronic engineering 85 (5-6), 778-781, 2008 | 14 | 2008 |
A Study on Decisive Early Stages in White Etching Crack Formation Induced by Lubrication J Wranik, W Holweger, T Lutz, P Albrecht, B Reichel, L Wang Lubricants 10 (5), 96, 2022 | 13 | 2022 |
Planar double gate transistors with asymmetric independent gates G Ilicali, W Weber, W Rosner, L Dreeskornfeld, J Hartwich, J Kretz, T Lutz, ... 2005 IEEE International SOI Conference Proceedings, 126-127, 2005 | 12 | 2005 |
Low temperature graphene growth S Kumar, N McEvoy, T Lutz, G Keeley, N Whiteside, W Blau, GS Duesberg ECS Transactions 19 (5), 175, 2009 | 11 | 2009 |
Evaluation of hybrid lithography and mix and match scenarios for electron beam direct write applications C Hohle, C Arndt, KH Choi, J Kretz, T Lutz, F Thrum, K Keil Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2007 | 11 | 2007 |
Anisotropic etching induced by surface energy driven agglomeration S Jung Jung, T Lutz, JJ Boland Journal of Vacuum Science & Technology A 29 (5), 2011 | 10 | 2011 |