| Poly (3-methylthiophene)-coated electrodes: optical and electrical properties as a function of redox potential and amplification of electrical and chemical signals using poly … JW Thackeray, HS White, MS Wrighton The Journal of Physical Chemistry 89 (23), 5133-5140, 1985 | 447 | 1985 |
| Microelectrochemical devices MS Wrighton, HS White Jr, JW Thackeray US Patent 4,717,673, 1988 | 439 | 1988 |
| Chemically responsive microelectrochemical devices based on platinized poly (3-methylthiophene): variation in conductivity with variation in hydrogen, oxygen, or pH in aqueous … JW Thackeray, MS Wrighton The Journal of Physical Chemistry 90 (25), 6674-6679, 1986 | 172 | 1986 |
| Nanoscopic cylindrical dual concentric and lengthwise block brush terpolymers as covalent preassembled high-resolution and high-sensitivity negative-tone photoresist materials G Sun, S Cho, C Clark, SV Verkhoturov, MJ Eller, A Li, A Pavía-Jiménez, ... Journal of the American Chemical Society 135 (11), 4203-4206, 2013 | 125 | 2013 |
| Deep UV ANR photoresists for 248 nm excimer laser photolithography JW Thackeray, GW Orsula, EK Pavelchek, D Canistro, LE Bogan Jr, ... Advances in Resist Technology and Processing VI 1086, 34-47, 1989 | 112 | 1989 |
| Effect of acid diffusion on performance in positive deep ultraviolet resists TH Fedynyshyn, JW Thackeray, JH Georger, MD Denison Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 1994 | 110 | 1994 |
| Interaction of thiols with n-type cadmium sulfide and n-type cadmium selenide in aqueous solutions: adsorption of thiolate anion and efficient photoelectrochemical oxidation to … MJ Natan, JW Thackeray, MS Wrighton The Journal of Physical Chemistry 90 (17), 4089-4098, 1986 | 104 | 1986 |
| Generation of powerful tungsten reductants by visible light excitation W Sattler, ME Ener, JD Blakemore, AA Rachford, PJ LaBeaume, ... Journal of the American Chemical Society 135 (29), 10614-10617, 2013 | 103 | 2013 |
| Photoresist pattern fabrication employing chemically amplified metalized material JW Thackeray, SA Fine US Patent 4,921,778, 1990 | 94 | 1990 |
| Materials challenges for sub-20-nm lithography JW Thackeray Journal of Micro/Nanolithography, MEMS, and MOEMS 10 (3), 033009-033009-, 2011 | 93 | 2011 |
| Chemically amplified resists AA Lamola, CR Szmanda, JW Thackeray Solid State Technology 34 (8), 53-61, 1991 | 83 | 1991 |
| Interaction of diethyldithiocarbamate with n-type cadmium sulfide and cadmium selenide: efficient photoelectrochemical oxidation to the disulfide and flat-band potential of the … JW Thackeray, MJ Natan, P Ng, MS Wrighton Journal of the American Chemical Society 108 (13), 3570-3577, 1986 | 74 | 1986 |
| Statistical simulation of resist at EUV and ArF JJ Biafore, MD Smith, CA Mack, JW Thackeray, R Gronheid, ... Advances in Resist Materials and Processing Technology XXVI 7273, 1207-1216, 2009 | 71 | 2009 |
| Photoresist pattern fabrication employing chemically amplified metalized material JW Thackeray, SA Fine US Patent 5,108,875, 1992 | 68 | 1992 |
| Amplification of electrical signals with molecule-based transistors: power amplification up to a kilohertz frequency and factors limiting higher frequency operation EP Lofton, JW Thackeray, MS Wrighton The Journal of Physical Chemistry 90 (23), 6080-6083, 1986 | 68 | 1986 |
| Stochastic exposure kinetics of extreme ultraviolet photoresists: simulation study CA Mack, JW Thackeray, JJ Biafore, MD Smith Journal of Micro/Nanolithography, MEMS, and MOEMS 10 (3), 033019-033019-, 2011 | 63 | 2011 |
| Photoresist composition with copolymer binder having a major proportion of phenolic units and a minor proportion of non-aromatic cyclic alcoholic units J Thackeray, GW Orsula, R Sinta US Patent 5,128,232, 1992 | 59 | 1992 |
| Coating compositions for use with an overcoated photoresist JW Thackeray, GB Wayton, CR Szmanda US Patent 7,585,612, 2009 | 57 | 2009 |
| Antihalation compositions JW Thackeray, GW Orsula US Patent 6,528,235, 2003 | 57 | 2003 |
| Lithographic performance of an environmentally stable chemically amplified photoresist (ESCAP) W Conley, G Breyta, WR Brunsvold, RA Di Pietro, DC Hofer, SJ Holmes, ... Advances in Resist Technology and Processing XIII 2724, 34-60, 1996 | 56 | 1996 |
Karen WooleyTexas A&M UniversityVerified email at chem.tamu.edu
