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Munehiro Tada
Munehiro Tada
NanoBridge Semiconductor, Inc.
Verified email at ieee.org
Title
Cited by
Cited by
Year
Preparation and characterization of MgF2 thin film by a trifluoroacetic acid method
S Fujihara, M Tada, T Kimura
Thin Solid Films 304 (1-2), 252-255, 1997
1071997
Polymer solid-electrolyte switch embedded on CMOS for nonvolatile crossbar switch
M Tada, K Okamoto, T Sakamoto, M Miyamura, N Banno, H Hada
IEEE Transactions on Electron Devices 58 (12), 4398-4406, 2011
802011
Sol-gel processing and characterization of alkaline earth and rare-earth fluoride thin films
M Tada, S Fujihara, T Kimura
Journal of materials research 14 (4), 1610-1616, 1999
801999
Controlling factors for the conversion of trifluoroacetate sols into thin metal fluoride coatings
S Fujihara, M Tada, T Kimura
Journal of Sol-Gel Science and Technology 19, 311-314, 2000
722000
Semiconductor device and method of manufacturing the same
M Tada, T Sakamoto, H Hada, N Banno
US Patent 9,406,877, 2016
622016
Semiconductor device and method of manufacturing the same
M Tada, T Sakamoto, H Hada, N Banno
US Patent 9,406,877, 2016
622016
Programmable cell array using rewritable solid-electrolyte switch integrated in 90nm CMOS
M Miyamura, S Nakaya, M Tada, T Sakamoto, K Okamoto, N Banno, ...
2011 IEEE International Solid-State Circuits Conference, 228-229, 2011
622011
Low temperature (≤ 380° C) and high performance Ge CMOS technology with novel source/drain by metal-induced dopants activation and high-k/metal gate stack for monolithic 3D …
JH Park, M Tada, D Kuzum, P Kapur, HY Yu, KC Saraswat
2008 IEEE International Electron Devices Meeting, 1-4, 2008
612008
Sol–gel synthesis of inorganic complex fluorides using trifluoroacetic acid
S Fujihara, S Ono, Y Kishiki, M Tada, T Kimura
Journal of Fluorine Chemistry 105 (1), 65-70, 2000
562000
High performance germanium N+∕ P and P+∕ N junction diodes formed at low Temperature (⩽ 380° C) using metal-induced dopant activation
JH Park, D Kuzum, M Tada, KC Saraswat
Applied Physics Letters 93 (19), 2008
482008
First demonstration of logic mapping on nonvolatile programmable cell using complementary atom switch
M Miyamura, M Tada, T Sakamoto, N Banno, K Okamoto, N Iguchi, ...
2012 International Electron Devices Meeting, 10.6. 1-10.6. 4, 2012
442012
Nonvolatile Crossbar Switch UsingSolid Electrolyte
M Tada, T Sakamoto, N Banno, M Aono, H Hada, N Kasai
IEEE transactions on electron devices 57 (8), 1987-1995, 2010
432010
Chemical structure effects of ring-type siloxane precursors on properties of plasma-polymerized porous SiOCH films
M Tada, H Yamamoto, F Ito, T Takeuchi, N Furutake, Y Hayashi
Journal of the Electrochemical Society 154 (7), D354, 2007
422007
Semiconductor device and manufacturing method for semiconductor device
M Tada, M Miyamura, H Hada
US Patent 9,029,825, 2015
402015
Semiconductor device and method for manufacturing the same
M Tada, H Hada
US Patent 8,536,629, 2013
382013
Metal-induced dopant (boron and phosphorus) activation process in amorphous germanium for monolithic three-dimensional integration
JH Park, M Tada, WS Jung, HSP Wong, KC Saraswat
Journal of Applied Physics 106 (7), 2009
362009
Self-nucleation free and dimension dependent metal-induced lateral crystallization of amorphous germanium for single crystalline germanium growth on insulating substrate
JH Park, M Tada, P Kapur, H Peng, KC Saraswat
Journal of Applied Physics 104 (6), 2008
362008
Semiconductor device with variable resistance element and method for manufacturing the same
Y Sakotsubo, M Terai, M Tada, Y Yabe, Y Saito
US Patent 8,766,233, 2014
352014
Improved off-state reliability of nonvolatile resistive switch with low programming voltage
M Tada, T Sakamoto, M Miyamura, N Banno, K Okamoto, N Iguchi, ...
IEEE transactions on electron devices 59 (9), 2357-2362, 2012
342012
Low-temperature, low-pressure chemical vapor deposition and solid phase crystallization of silicon–germanium films
M Tada, JH Park, JR Jain, KC Saraswat
Journal of the Electrochemical Society 156 (1), D23, 2008
342008
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