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Hei Wong
Hei Wong
City University of Hong Kong
Verified email at ieee.org
Title
Cited by
Cited by
Year
On the scaling issues and high-κ replacement of ultrathin gate dielectrics for nanoscale MOS transistors
H Wong, H Iwai
Microelectronic Engineering 83 (10), 1867-1904, 2006
4952006
Low-frequency noise study in electron devices: review and update
H Wong
Microelectronics Reliability 43 (4), 585-599, 2003
1602003
Electronic structure and charge transport properties of amorphous Ta2O5 films
VA Shvets, VS Aliev, DV Gritsenko, SS Shaimeev, EV Fedosenko, ...
Journal of non-crystalline solids 354 (26), 3025-3033, 2008
1442008
Conduction mechanisms in MOS gate dielectric films
BL Yang, PT Lai, H Wong
Microelectronics Reliability 44 (5), 709-718, 2004
1302004
Electronic structure of α-Al2O3: Ab initio simulations and comparison with experiment
TV Perevalov, AV Shaposhnikov, VA Gritsenko, H Wong, JH Han, CW Kim
Jetp Letters 85, 165-168, 2007
1202007
Defects in silicon oxynitride gate dielectric films
H Wong, VA Gritsenko
Microelectronics Reliability 42 (4-5), 597-605, 2002
1122002
Atomic and electronic structure of amorphous and crystalline hafnium oxide: X-ray photoelectron spectroscopy and density functional calculations
TV Perevalov, VA Gritsenko, SB Erenburg, AM Badalyan, H Wong, ...
Journal of Applied Physics 101 (5), 2007
1082007
Excess silicon at the silicon nitride/thermal oxide interface in oxide–nitride–oxide structures
VA Gritsenko, H Wong, JB Xu, RM Kwok, IP Petrenko, BA Zaitsev, ...
Journal of applied physics 86 (6), 3234-3240, 1999
1061999
The road to miniaturization
H Wong, H Iwai
Physics World 18 (9), 40, 2005
952005
Short-range order in non-stoichiometric amorphous silicon oxynitride and silicon-rich nitride
VA Gritsenko, RWM Kwok, H Wong, JB Xu
Journal of non-crystalline solids 297 (1), 96-101, 2002
922002
XPS study of the thermal instability of HfO2 prepared by Hf sputtering in oxygen with RTA
N Zhan, MC Poon, CW Kok, KL Ng, H Wong
Journal of the Electrochemical Society 150 (10), F200, 2003
892003
Silicon dots/clusters in silicon nitride: photoluminescence and electron spin resonance
VA Gritsenko, KS Zhuravlev, AD Milov, H Wong, RWM Kwok, JB Xu
Thin Solid Films 353 (1-2), 20-24, 1999
821999
Interface bonding structure of hafnium oxide prepared by direct sputtering of hafnium in oxygen
H Wong, KL Ng, N Zhan, MC Poon, CW Kok
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2004
802004
Recent developments in silicon optoelectronic devices
H Wong
2002 23rd International Conference on Microelectronics. Proceedings (Cat. No …, 2002
802002
Nanometer Cmos
F Schwierz, H Wong, JJ Liou
Pan Stanford Publishing, 2010
75*2010
X-ray photoelectron spectroscopy study of high-k CeO2/La2O3 stacked dielectrics
J Zhang, H Wong, D Yu, K Kakushima, H Iwai
AIP Advances 4 (11), 2014
692014
Luminescence of intrinsic and extrinsic defects in hafnium oxide films
AA Rastorguev, VI Belyi, TP Smirnova, LV Yakovkina, MV Zamoryanskaya, ...
Physical Review B 76 (23), 235315, 2007
672007
Nano-CMOS gate dielectric engineering
H Wong
Crc Press, 2011
642011
Material properties of interfacial silicate layer and its influence on the electrical characteristics of MOS devices using hafnia as the gate dielectric
H Wong, B Sen, V Filip, MC Poon
Thin Solid Films 504 (1-2), 192-196, 2006
642006
Bonding structures of silicon oxynitride prepared by oxidation of Si-rich silicon nitride
MC Poon, CW Kok, H Wong, PJ Chan
Thin Solid Films 462, 42-45, 2004
612004
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