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Alok Ranjan
Alok Ranjan
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Title
Cited by
Cited by
Year
Conductive Atomic Force Microscope Study of Bipolar and Threshold Resistive Switching in 2D Hexagonal Boron Nitride Films
A Ranjan, N Raghavan, SJ O'Shea, S Mei, M Bosman, K Shubhakar, ...
Scientific Reports 8 (1), 2018
622018
Dielectric breakdown in single-crystal hexagonal boron nitride
A Ranjan, N Raghavan, M Holwill, K Watanabe, T Taniguchi, ...
ACS Applied Electronic Materials 3 (8), 3547-3554, 2021
362021
Random telegraph noise in 2D hexagonal boron nitride dielectric films
A Ranjan, FM Puglisi, N Raghavan, SJ O'Shea, K Shubhakar, P Pavan, ...
Applied Physics Letters 112 (13), 2018
282018
Analysis of quantum conductance, read disturb and switching statistics in HfO2 RRAM using conductive AFM
A Ranjan, N Raghavan, J Molina, SJ O'Shea, K Shubhakar, KL Pey
Microelectronics Reliability 64, 172-178, 2016
252016
Sb2Te3 and Its Superlattices: Optimization by Statistical Design
JK Behera, X Zhou, A Ranjan, RE Simpson
ACS applied materials & interfaces 10 (17), 15040-15050, 2018
232018
CAFM based Spectroscopy of Stress-Induced Defects in HfO2 with Experimental Evidence of the Clustering Model and Metastable Vacancy Defect State
AR Nagarajan Raghavan, Shubhakar Kalya, Ramesh Thamankar, Joel Molina, Sean ...
2016 IEEE International Reliability Physics Symposium (IRPS), 2016
192016
Boron vacancies causing breakdown in 2D layered hexagonal boron nitride dielectrics
A Ranjan, N Raghavan, FM Puglisi, S Mei, A Padovani, L Larcher, ...
IEEE Electron Device Letters 40 (8), 1321-1324, 2019
182019
Conductive filament formation at grain boundary locations in polycrystalline HfO2-based MIM stacks: Computational and physical insight
K Shubhakar, S Mei, M Bosman, N Raghavan, A Ranjan, SJ O'Shea, ...
Microelectronics Reliability 64, 204-209, 2016
132016
Localized probing of dielectric breakdown in multilayer hexagonal boron nitride
A Ranjan, SJ O’Shea, M Bosman, N Raghavan, KL Pey
ACS Applied Materials & Interfaces 12 (49), 55000-55010, 2020
122020
Mechanism of Soft and Hard Breakdown in Hexagonal Boron Nitride 2D Dielectrics
A Ranjan, N Raghavan, SJ O’Shea, S Mei, M Bosman, K Shubhakar, ...
2018 IEEE International Reliability Physics Symposium (IRPS), 2018
122018
Resistive switching characteristics of MIM structures based on oxygen-variable ultra-thin HfO2 and fabricated at low temperature
J Molina, R Torres, A Ranjan, KL Pey
Materials Science in Semiconductor Processing 66, 191-199, 2017
122017
Localized characterization of charge transport and random telegraph noise at the nanoscale in HfO2 films combining scanning tunneling microscopy and multi-scale simulations
R Thamankar, FM Puglisi, A Ranjan, N Raghavan, K Shubhakar, J Molina, ...
Journal of Applied Physics 122 (2), 2017
122017
The interplay between drift and electrical measurement in conduction atomic force microscopy
A Ranjan, KL Pey, SJ O'Shea
Review of Scientific Instruments 90 (7), 073701, 2019
92019
Random Telegraph Noise Nano-Spectroscopy in High-κ Dielectrics Using Scanning Probe Microscopy Techniques
A Ranjan, N Raghavan, K Shubhakar, SJ O’Shea, KL Pey
Noise in Nanoscale Semiconductor Devices, 417-440, 2020
62020
Probing resistive switching in HfO2/Al2O3 bilayer oxides using in-situ transmission electron microscopy
A Ranjan, H Xu, C Wang, J Molina, X Wu, H Zhang, L Sun, J Chu, KL Pey
Applied Materials Today 31, 101739, 2023
52023
An SEM/STM based nanoprobing and TEM study of breakdown locations in HfO2/SiOx dielectric stacks for failure analysis
K Shubhakar, M Bosman, OA Neucheva, YC Loke, N Raghavan, ...
Microelectronics Reliability 55 (9-10), 1450-1455, 2015
52015
Molecular bridges link monolayers of hexagonal boron nitride during dielectric breakdown
A Ranjan, SJ O’Shea, A Padovani, T Su, P La Torraca, YS Ang, ...
ACS Applied Electronic Materials 5 (2), 1262-1276, 2023
42023
Correlation of dielectric breakdown and nanoscale adhesion in silicon dioxide thin films
A Ranjan, SJ O’Shea, M Bosman, J Molina, N Raghavan, KL Pey
2020 IEEE International Reliability Physics Symposium (IRPS), 1-7, 2020
32020
Localized Random Telegraphic Noise Study in HfO2dielectric stacks using Scanning Tunneling Microscopy — Analysis of process and stress-induced traps
A Ranjan, K Shubhakar, N Raghavan, R Thamankar, M Bosman, ...
2015 IEEE 22nd International Symposium on the Physical and Failure Analysis …, 2015
32015
Adhesion Microscopy as a Nanoscale Probe for Oxidation and Charge Generation at Metal-Oxide Interfaces
A Ranjan, A Padovani, B Dianat, N Raghavan, KL Pey, SJ O’Shea
ACS Applied Electronic Materials 5 (9), 5176-5186, 2023
22023
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