Vertical Si-Nanowire-Type Tunneling FETs With Low Subthreshold Swing () at Room Temperature R Gandhi, Z Chen, N Singh, K Banerjee, S Lee IEEE Electron Device Letters 32 (4), 437-439, 2011 | 365 | 2011 |
CMOS-Compatible Vertical-Silicon-Nanowire Gate-All-Around p-Type Tunneling FETs With-mV/decade Subthreshold Swing R Gandhi, Z Chen, N Singh, K Banerjee, S Lee IEEE Electron Device Letters 32 (11), 1504-1506, 2011 | 199 | 2011 |
Vertical silicon nanowire platform for low power electronics and clean energy applications DL Kwong, X Li, Y Sun, G Ramanathan, ZX Chen, SM Wong, Y Li, ... Journal of Nanotechnology 2012, 2012 | 50 | 2012 |
Ferroelectric Devices and Methods of Forming Ferroelectric Devices DVNR Ashonita A. Chavan, Ramanathan Gandhi, Beth R. Cook US Patent 20,170,345,831, 2017 | 13* | 2017 |
Hydraulic transport of solids RA Hill, PE Snock, RL Gandhi The pump handbook. 2nd ed. New York: McGraw-Hill, 1986 | 6 | 1986 |
Vertical Nanowire Gate-All-Around p-type Tunneling Field-Effect Transistor With Si0. 8Ge0. 2/Si Heterojunction A Soundarapandian, R Gandhi, Z Chen, X Li, NSS Lee International Conference on Solid-tate and Integrated Circuit 32, 2012 | 3 | 2012 |
Intermediate layer thickness dependence on switching field distribution in perpendicular recording media R Sbiaa, R Gandhi, K Srinivasan, SN Piramanayagam, RM Seoh Journal of magnetism and magnetic materials 321 (17), 2682-2684, 2009 | 3 | 2009 |
Semiconductor devices, transistors, and related methods for contacting metal oxide semiconductor devices DVN Ramaswamy, R Gandhi, SE Sills US Patent 11,335,788, 2022 | 2 | 2022 |
Assemblies which include ruthenium-containing conductive gates R Gandhi US Patent 10,964,793, 2021 | 1 | 2021 |
Methods of forming a device, and related devices, memory devices, and electronic systems SE Sills, R Gandhi, DVN Ramaswamy US Patent App. 16/596,487, 2020 | 1 | 2020 |
Influence of SF6/N2 Gas Mixture Ratios on the Lightning Streamer Propagation Characteristics of 22 kV MV Circuit Breaker R Gandhi, S Chandrasekar, C Nagarajan Journal of Electrical Engineering and Technology 13 (4), 1663-1672, 2018 | 1 | 2018 |
Integrated assemblies having semiconductor oxide channel material, and methods of forming integrated assemblies YF Lee, I Asano, R Gandhi, SE Sills US Patent 11,329,133, 2022 | | 2022 |
Elevationally-Extending Transistors, Devices Comprising Elevationally-Extending Transistors, And Methods Of Forming A Device Comprising Elevationally-Extending Transistors SE Sills, KD Prall, DVN Ramaswamy, R Gandhi US Patent App. 17/472,895, 2021 | | 2021 |
Integrated Assemblies Comprising Hydrogen Diffused Within Two or More Different Semiconductor Materials, and Methods of Forming Integrated Assemblies KM Karda, YF Lee, H Liu, DVN Ramaswamy, R Gandhi, K Sarpatwari, ... US Patent App. 17/396,049, 2021 | | 2021 |
Elevationally-extending transistors, devices comprising elevationally-extending transistors, and methods of forming a device comprising elevationally-extending transistors SE Sills, KD Prall, DVN Ramaswamy, R Gandhi US Patent 11,152,509, 2021 | | 2021 |
Integrated assemblies comprising hydrogen diffused within two or more different semiconductor materials, and methods of forming integrated assemblies KM Karda, YF Lee, H Liu, DVN Ramaswamy, R Gandhi, K Sarpatwari, ... US Patent 11,107,817, 2021 | | 2021 |
Integrated Assemblies Having Polycrystalline First Semiconductor Material Adjacent Conductively-Doped Second Semiconductor Material KM Karda, DC Pandey, H Liu, RJ Hill, G Huang, Y Gao, R Gandhi, ... US Patent App. 17/317,668, 2021 | | 2021 |
Assemblies Which Include Ruthenium-Containing Conductive Gates R Gandhi US Patent App. 17/194,971, 2021 | | 2021 |
Integrated assemblies having polycrystalline first semiconductor material adjacent conductively-doped second semiconductor material KM Karda, DC Pandey, H Liu, RJ Hill, G Huang, Y Gao, R Gandhi, ... US Patent 11,038,027, 2021 | | 2021 |
Device including a vertical transistor having a large band gap channel material and void spaces adjacent gate electrodes, and related methods and systems KM Karda, R Gandhi, H Li, H Liu, DVN Ramaswamy, SD Tang, SE Sills US Patent 10,998,440, 2021 | | 2021 |