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Luca Morassi
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Influence of buffer carbon doping on pulse and AC behavior of insulated-gate field-plated power AlGaN/GaN HEMTs
G Verzellesi, L Morassi, G Meneghesso, M Meneghini, E Zanoni, ...
IEEE Electron Device Letters 35 (4), 443-445, 2014
1092014
Mechanism of high-k dielectric-induced breakdown of the interfacial SiO2 layer
G Bersuker, D Heh, CD Young, L Morassi, A Padovani, L Larcher, KS Yew, ...
2010 IEEE International Reliability Physics Symposium, 373-378, 2010
422010
InAs quantum-well MOSFET (Lg = 100 nm) with record high gm, fT and fmax
TW Kim, RJW Hill, CD Young, D Veksler, L Morassi, S Oktybrshky, J Oh, ...
2012 Symposium on VLSI Technology (VLSIT), 179-180, 2012
352012
Errors Limiting Split-Mobility Extraction Accuracy in Buried-Channel InGaAs MOSFETs
L Morassi, G Verzellesi, H Zhao, JC Lee, D Veksler, G Bersuker
IEEE transactions on electron devices 59 (4), 1068-1075, 2012
312012
Errors Limiting Split-Mobility Extraction Accuracy in Buried-Channel InGaAs MOSFETs
L Morassi, G Verzellesi, H Zhao, JC Lee, D Veksler, G Bersuker
IEEE transactions on electron devices 59 (4), 1068-1075, 2012
312012
A physical model for post-breakdown digital gate current noise
A Padovani, L Morassi, N Raghavan, L Larcher, W Liu, KL Pey, ...
IEEE electron device letters 31 (9), 1032-1034, 2010
132010
A new method for extracting interface state and border trap densities in high-k/III-V MOSFETs
G Sereni, L Vandelli, L Larcher, L Morassi, D Veksler, G Bersuker
2014 IEEE International Reliability Physics Symposium, 2C. 3.1-2C. 3.6, 2014
112014
Extraction of interfacial state density in high-k/III-V gate stacks: problems and solutions
D Veksler, G Bersuker, L Morassi, JH Yum, G Verzellesi, WE Wang, ...
IEEE NMDC, 2013
102013
Extraction of interface state density in oxide/III–V gate stacks
D Veksler, G Bersuker, H Madan, L Morassi, G Verzellesi
Semiconductor Science and Technology 30 (6), 065013, 2015
92015
Interface-Trap Effects in Inversion-Type Enhancement-ModeN-Channel MOSFETs
L Morassi, A Padovani, G Verzellesi, D Veksler, I Ok, G Bersuker
IEEE transactions on electron devices 58 (1), 107-114, 2010
92010
Interface-Trap Effects in Inversion-Type Enhancement-ModeN-Channel MOSFETs
L Morassi, A Padovani, G Verzellesi, D Veksler, I Ok, G Bersuker
IEEE transactions on electron devices 58 (1), 107-114, 2010
92010
Comprehensive Capacitance–Voltage Simulation and Extraction Tool Including Quantum Effects for High- on SixGe1−x and InxGa1−xAs: Part II—Fits and …
SRM Anwar, WG Vandenberghe, G Bersuker, D Veksler, G Verzellesi, ...
IEEE Transactions on Electron Devices 64 (9), 3794-3801, 2017
72017
Engineering Barrier and Buffer Layers in InGaAs Quantum-Well MOSFETs
L Morassi, G Verzellesi, H Zhao, JC Lee, D Veksler, G Bersuker
IEEE transactions on electron devices 59 (12), 3651-3654, 2012
42012
Analysis of interface-trap effects in inversion-type InGaAs/ZrO2 MOSFETs
L Morassi, G Verzellesi, A Padovani, L Larcher, P Pavan, D Veksler, I Ok, ...
2010 IEEE International Reliability Physics Symposium, 532-535, 2010
22010
Errors affecting split-CV mobility measurements in InGaAs MOS-HEMTs
L Morassi, G Verzellesi, L Larcher, H Zhao, JC Lee
IPRM 2011-23rd International Conference on Indium Phosphide and Related …, 2011
12011
Experimental/numerical investigation of buried-channel InGaA MOS-HEMTs with Al2O3 gate dielectric
L Morassi, G Verzellesi, P Pavan, D Veksler, I Ok, H Zhao, JC Lee, ...
IPRM 2011-23rd International Conference on Indium Phosphide and Related …, 2011
12011
Experimental/numerical investigation of buried-channel InGaAs MOS-HEMTs with Al2O3 gate dielectric
L Morassi, G Verzellesi, P Pavan, D Veksler, I Ok, H Zhao, JC Lee, ...
Proceedings of IPRM 2011, 103-105, 2011
12011
Dispositivi MOSFET con Canale in InGaAs per l’Estensione della Tecnologia CMOS oltre il Nodo “16-nm
L MORASSI
2013
Connecting electrical and structural dielectric characteristics
G Bersuker, D Veksler, CD Young, H Park, W Taylor, P Kirsch, R Jammy, ...
International Journal of High Speed Electronics and Systems 20 (01), 65-79, 2011
2011
Study of the Impact of Interface Traps on the Electrical Characteristics of InGaAs-based MOSFETs and MOSHEMTs with high-k Gate Dielectrics
L Morassi, A Padovani, G Verzellesi, D Veksler, I Ok, G Bersuker
19th European Workshop on Heterostructure Technology, 1-2, 2010
2010
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