Lin Lee Cheong
Lin Lee Cheong
Amazon AWS
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Thermal probe maskless lithography for 27.5 nm half-pitch Si technology
LL Cheong, P Paul, F Holzner, M Despont, DJ Coady, JL Hedrick, R Allen, ...
Nano letters 13 (9), 4485-4491, 2013
Neon ion beam lithography (NIBL)
D Winston, VR Manfrinato, SM Nicaise, LL Cheong, H Duan, D Ferranti, ...
Nano letters 11 (10), 4343-4347, 2011
Sub-5 keV electron-beam lithography in hydrogen silsesquioxane resist
VR Manfrinato, LL Cheong, H Duan, D Winston, HI Smith, KK Berggren
Microelectronic Engineering 88 (10), 3070-3074, 2011
Three-dimensional photonic crystals by large-area membrane stacking
L Lu, LL Cheong, HI Smith, SG Johnson, JD Joannopoulos, M Soljačić
Optics letters 37 (22), 4726-4728, 2012
EUV processing and characterization for BEOL
N Saulnier, Y Xu, W Wang, L Sun, LL Cheong, R Lallement, G Beique, ...
Extreme Ultraviolet (EUV) Lithography VI 9422, 234-245, 2015
Thermal probe nanolithography: in-situ inspection, high-speed, high-resolution, 3D
F Holzner, P Paul, M Despont, LL Cheong, J Hedrick, U Dürig, A Knoll
29th European Mask and Lithography Conference 8886, 26-34, 2013
3D nanostructures by stacking pre-patterned fluid-supported single-crystal Si membranes
S Ghadarghadr, CP Fucetola, L Lee Cheong, E E. Moon, H I. Smith
Journal of Vacuum Science & Technology B, Nanotechnology and …, 2011
Identification of hot spots or defects by machine learning
J Su, Y Zou, C Lin, S Hunsche, M Jochemsen, YW Lu, LL CHEONG
US Patent App. 16/300,380, 2019
Membrane-integrated superconducting nanowire singlephoton detectors
F Najafi, J Mower, X Hu, F Bellei, P Kharel, A Dane, Y Ivry, L Cheong, ...
CLEO: 2013, 1-2, 2013
Closed-loop high-speed 3D thermal probe nanolithography
AW Knoll, M Zientek, LL Cheong, C Rawlings, P Paul, F Holzner, ...
Alternative Lithographic Technologies VI 9049, 47-54, 2014
Exploring EUV mask backside defectivity and control methods
C Turley, J Rankin, L Kindt, M Lawliss, L Bolton, K Collins, L Cheong, ...
Photomask Japan 2015: Photomask and Next-Generation Lithography Mask …, 2015
EUV mask cleans comparison of frontside and dual-sided concurrent cleaning
LL Cheong, LM Kindt, C Turley, D Leonhard, JM Boyle, CF Robinson, ...
Extreme Ultraviolet (EUV) Lithography VI 9422, 521-530, 2015
Failure detection and classsification using sensor data and/or measurement data
T Honda, LL Cheong, L Kuravi
US Patent 11,029,359, 2021
Reduction of Critical Dimension Difference in Litho-Etch-Litho-Etch Double Patterning Process
H Tang, JC Shearer, LL Cheong, NA Saulnier, SA Sieg, K Petrillo, A Metz, ...
Journal of Photopolymer Science and Technology 28 (1), 13-16, 2015
Secondary-electron signal level measurements of self-assembled monolayers for spatial-phase-locked electron-beam lithography
L Lee Cheong, JM Lobez, EE Moon, JT Hastings, HI Smith
Journal of Vacuum Science & Technology B, Nanotechnology and …, 2011
Rational Decision-Making Tool for Semiconductor Processes
T Honda, LL Cheong, L Kuravi, B Cirlin
US Patent App. 17/303,666, 2021
Methods for determining an approximate value of a processing parameter at which a characteristic of the patterning process has a target value
LL Cheong, W Huang, B La Fontaine
US Patent 11,126,092, 2021
Collaborative Learning Model for Semiconductor Applications
T Honda, R Burch, J Kibarian, LL Cheong, Q Zhu, V Reddipalli, K Harris, ...
US Patent App. 17/070,520, 2021
Anomalous Equipment Trace Detection and Classification
R Burch, JD David, Q Zhu, T Honda, LL Cheong
US Patent App. 17/064,422, 2021
Selective inclusion/exclusion of semiconductor chips in accelerated failure tests
LL Cheong, T Honda, RD Kekatpure, L Kuravi, JD David
US Patent 10,777,470, 2020
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