| Handbook of optical microcavities AHW Choi CRC Press, 2014 | 23 | 2014 |
| Lasing in metal-coated GaN nanostripe at room temperature YG Wang, CC Chen, CH Chiu, MY Kuo, MH Shih, HC Kuo Applied Physics Letters 98 (13), 2011 | 19 | 2011 |
| Room temperature lasing with high group index in metal-coated GaN nanoring YG Wang, SW Chang, CC Chen, CH Chiu, MY Kuo, MH Shih, HC Kuo Applied Physics Letters 99 (25), 2011 | 15 | 2011 |
| Enhancing defect detection with Zernike phase contrast in EUV multilayer blank inspection YG Wang, R Miyakawa, W Chao, M Benk, A Wojdyla, A Donoghue, ... Extreme Ultraviolet (EUV) Lithography VI 9422, 420-429, 2015 | 14 | 2015 |
| Zernike phase contrast microscope for EUV mask inspection YG Wang, R Miyakawa, A Neureuther, P Naulleau Extreme Ultraviolet (EUV) Lithography V 9048, 266-273, 2014 | 13 | 2014 |
| Phase measurements of EUV mask defects RA Claus, YG Wang, AJ Wojdyla, MP Benk, KA Goldberg, AR Neureuther, ... Extreme Ultraviolet (EUV) Lithography VI 9422, 376-381, 2015 | 12 | 2015 |
| Phase-enhanced defect sensitivity for EUV mask inspection YG Wang, R Miyakawa, W Chao, K Goldberg, A Neureuther, P Naulleau Photomask Technology 2014 9235, 126-133, 2014 | 10 | 2014 |
| Extreme ultraviolet mask roughness effects in high numerical aperture lithography P Naulleau, YG Wang, T Pistor Applied optics 57 (7), 1724-1730, 2018 | 8 | 2018 |
| Emulation of anamorphic imaging on the SHARP extreme ultraviolet mask microscope MP Benk, A Wojdyla, W Chao, F Salmassi, S Oh, YG Wang, RH Miyakawa, ... Journal of Micro/Nanolithography, MEMS, and MOEMS 15 (3), 033501-033501, 2016 | 7 | 2016 |
| Broader view on extreme ultraviolet masks: adding complementary imaging modes to the SHARP microscope MP Benk, RH Miyakawa, W Chao, YG Wang, A Wojdyla, DG Johnson, ... Journal of Micro/Nanolithography, MEMS, and MOEMS 14 (1), 013507-013507, 2015 | 5 | 2015 |
| Impact of noise sources and optical design on defect detection sensitivity in extreme ultraviolet actinic pattern inspection tool YG Wang, AR Neureuther, PP Naulleau Journal of Micro/Nanolithography, MEMS, and MOEMS 16 (1), 013504-013504, 2017 | 4 | 2017 |
| Enhancing native defect sensitivity for EUV actinic blank inspection: optimized pupil engineering and photon noise study YG Wang, A Neureuther, P Naulleau Extreme Ultraviolet (EUV) Lithography VII 9776, 390-397, 2016 | 4 | 2016 |
| Emulation of anamorphic imaging on the SHARP EUV mask microscope MP Benk, A Wojdyla, W Chao, F Salmassi, S Oh, YG Wang, RH Miyakawa, ... Extreme Ultraviolet (EUV) Lithography VII 9776, 440-449, 2016 | 4 | 2016 |
| The study of phase effects in EUV mask pattern defects YG Wang, A Neureuther, P Naulleau Photomask Technology 2015 9635, 80-86, 2015 | 4 | 2015 |
| Key challenges in EUV mask technology: actinic mask inspection and mask 3D effects YG Wang UC Berkeley, 2017 | 3 | 2017 |
| Examination of phase retrieval algorithms for patterned EUV mask metrology RA Claus, YG Wang, A Wojdyla, MP Benk, KA Goldberg, AR Neureuther, ... Photomask Technology 2015 9635, 94-103, 2015 | 3 | 2015 |
| Partially coherent quantitative phase retrieval for EUV lithography RA Claus, YG Wang, MP Benk, KA Goldberg, PP Naulleau, ... Imaging Systems and Applications, ITh2A. 4, 2015 | 3 | 2015 |
| A broader view on EUV-masks: adding complementary imaging modes to the SHARP microscope MP Benk, RH Miyakawa, W Chao, YG Wang, A Wojdyla, DG Johnson, ... Photomask Technology 2014 9235, 115-125, 2014 | 3 | 2014 |
| Magnetically tunable metallic photonic crystals immersed in liquid crystal for terahertz wave RP Pan, CC Shih, TT Tang, YG Wang, HY Wu, CJ Lin, CL Pan Emerging Liquid Crystal Technologies VII 8279, 89-96, 2012 | 3 | 2012 |
| Efficient Fresnel zoneplate pattern data preparation for high-resolution nanofabrication YG Wang, RH Miyakawa, W Chao, PP Naulleau Optics Communications 402, 167-172, 2017 | 2 | 2017 |
Patrick NaulleauEUV Tech Inc. and Berkeley LabVerified email at euvtech.com
