| TiOx deposited by magnetron sputtering: a joint modelling and experimental study R Tonneau, P Moskovkin, A Pflug, S Lucas Journal of Physics D: Applied Physics 51 (19), 195202, 2018 | 31 | 2018 |
| Correlation of structural and optical properties using virtual materials analysis H Badorreck, M Steinecke, L Jensen, D Ristau, M Jupé, J Müller, ... Optics Express 27 (16), 22209-22225, 2019 | 20 | 2019 |
| Understanding the role of energetic particles during the growth of TiO2 thin films by reactive magnetron sputtering through multi-scale Monte Carlo simulations and experimental … R Tonneau, P Moskovkin, J Muller, T Melzig, E Haye, S Konstantinidis, ... Journal of Physics D: Applied Physics 54 (15), 155203, 2021 | 15 | 2021 |
| Magnetron sputtering: determining scaling relations towards real power discharges using 3D particle-in-cell Monte Carlo models R Tonneau, A Pflug, S Lucas Plasma Sources Science and Technology 29 (11), 115007, 2020 | 6 | 2020 |
| Comparison of experimental and Monte-Carlo simulation of MeV particle transport through tapered/straight glass capillaries and circular collimators F Hespeels, R Tonneau, T Ikeda, S Lucas Nuclear Instruments and Methods in Physics Research Section B: Beam …, 2015 | 5 | 2015 |
| Plasma polymerization of cyclopropylamine in a low-pressure cylindrical magnetron reactor: A PIC-MC study of the roles of ions and radicals S Mathioudaki, CR Vandenabeele, R Tonneau, A Pflug, J Tennyson, ... Journal of Vacuum Science & Technology A 38 (3), 2020 | 4 | 2020 |
| Do Pure Water-Radiolysis Experiments Truly Unlock the Secrets of the FLASH Effect? A Numerical Revelation R Tonneau, S Lucas, AC Heuskin | | 2023 |
| Plasma polymerization of cyclopropylamine in a low-pressure cylindrical magnetron reactor S Mathioudaki, C Vandenabeele, R Tonneau, A Pflug, J Tennyson, ... | | 2020 |
| TiOx deposited by magnetron sputtering R Tonneau, P Moskovkin, A Pflug, S Lucas | | 2018 |
| Simulations of oxide films growth deposited by magnetron sputtering and evaluation of their morphology and optical properties R Tonneau, P Moskovkin, S Lucas | | 2018 |
| THESIS/THÈSE R Tonneau | | |
| Atomistic modelling of thin film growth with realistic input data obtained from reactor-scale process simulation ICME 2016 A Pflug, T Melzig, M Siemers, K Schiffmann, M Vergöhl, G Bräuer, ... | | |
