Kenneth A. Goldberg
Kenneth A. Goldberg
Optical Physicist, Lawrence Berkeley National Laboratory; Advanced Light Source (ALS) & ALS-U
Verified email at lbl.gov - Homepage
Title
Cited by
Cited by
Year
Phase-shifting point diffraction interferometer
H Medecki, E Tejnil, KA Goldberg, J Bokor
Optics letters 21 (19), 1526-1528, 1996
2001996
Fourier-transform method of phase-shift determination
KA Goldberg, J Bokor
Applied optics 40 (17), 2886-2894, 2001
1512001
Extreme-ultraviolet phase-shifting point-diffraction interferometer: a wave-front metrology tool with subangstrom reference-wave accuracy
PP Naulleau, KA Goldberg, SH Lee, C Chang, D Attwood, J Bokor
Applied Optics 38 (35), 7252-7263, 1999
1381999
Hartmann wave-front measurement at 13.4 nm with λ EUV/120 accuracy
P Mercère, P Zeitoun, M Idir, S Le Pape, D Douillet, X Levecq, G Dovillaire, ...
Optics letters 28 (17), 1534-1536, 2003
1182003
Status of EUV micro-exposure capabilities at the ALS using the 0.3-NA MET optic
P Naulleau, KA Goldberg, EH Anderson, K Bradley, R Delano, P Denham, ...
Emerging Lithographic Technologies VIII 5374, 881-891, 2004
1092004
Extreme ultraviolet carrier-frequency shearing interferometry of a lithographic four-mirror optical system
PP Naulleau, KA Goldberg, J Bokor
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2000
882000
Fourier-synthesis custom-coherence illuminator for extreme ultraviolet microfield lithography
PP Naulleau, KA Goldberg, P Batson, J Bokor, P Denham, S Rekawa
Applied Optics 42 (5), 820-826, 2003
822003
Critical challenges for EUV resist materials
PP Naulleau, CN Anderson, LM Baclea-An, P Denham, S George, ...
Advances in Resist Materials and Processing Technology XXVIII 7972, 797202, 2011
762011
EUV engineering test stand
DA Tichenor, GD Kubiak, WC Replogle, LE Klebanoff, JB Wronosky, ...
Emerging Lithographic Technologies IV 3997, 48-69, 2000
762000
At-wavelength interferometry for extreme ultraviolet lithography
E Tejnil, KA Goldberg, SH Lee, H Medecki, PJ Batson, PE Denham, ...
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 1997
721997
System integration and performance of the EUV engineering test stand
DA Tichenor, AK Ray-Chaudhuri, WC Replogle, RH Stulen, GD Kubiak, ...
Emerging Lithographic Technologies V 4343, 19-37, 2001
712001
Microscopy of extreme ultraviolet lithography masks with 13.2 nm tabletop laser illumination
F Brizuela, Y Wang, CA Brewer, F Pedaci, W Chao, EH Anderson, Y Liu, ...
Optics letters 34 (3), 271-273, 2009
692009
Tunable coherent radiation in the soft X-ray and extreme ultraviolet spectral regions
DT Attwood, P Naulleau, KA Goldberg, E Tejnil, C Chang, R Beguiristain, ...
IEEE Journal of Quantum Electronics 35 (5), 709-720, 1999
691999
Actinic inspection of extreme ultraviolet programed multilayer defects and cross-comparison measurements
KA Goldberg, A Barty, Y Liu, P Kearney, Y Tezuka, T Terasawa, JS Taylor, ...
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2006
632006
EUV microexposures at the ALS using the 0.3-NA MET projection optics
P Naulleau, KA Goldberg, E Anderson, JP Cain, P Denham, B Hoef, ...
Emerging Lithographic Technologies IX 5751, 56-63, 2005
592005
Extreme ultraviolet microexposures at the Advanced Light Source using the 0.3 numerical aperture micro-exposure tool optic
PP Naulleau, KA Goldberg, E Anderson, JP Cain, P Denham, K Jackson, ...
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2004
582004
Dual-domain point diffraction interferometer
PP Naulleau, KA Goldberg
Applied optics 38 (16), 3523-3533, 1999
571999
Characterization of the accuracy of EUV phase-shifting point diffraction interferometry
PP Naulleau, KA Goldberg, SH Lee, CHC Chang, CJ Bresloff, PJ Batson, ...
Emerging Lithographic Technologies II 3331, 114-123, 1998
571998
At-wavelength alignment and testing of the 0.3 NA MET optic
KA Goldberg, PP Naulleau, PE Denham, SB Rekawa, K Jackson, ...
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2004
562004
Sub-70 nm extreme ultraviolet lithography at the advanced light source static microfield exposure station using the engineering test stand set-2 optic
P Naulleau, KA Goldberg, EH Anderson, D Attwood, P Batson, J Bokor, ...
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2002
562002
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