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Andras Vladar
Andras Vladar
Unknown affiliation
Verified email at nist.gov
Title
Cited by
Cited by
Year
Handbook of silicon semiconductor metrology
AC Diebold
CRC Press, 2001
2042001
Metrology for the next generation of semiconductor devices
NG Orji, M Badaroglu, BM Barnes, C Beitia, BD Bunday, U Celano, ...
Nature electronics 1 (10), 532-547, 2018
1922018
Development of the metrology and imaging of cellulose nanocrystals
MT Postek, A Vladár, J Dagata, N Farkas, B Ming, R Wagner, A Raman, ...
Measurement Science and Technology 22 (2), 024005, 2010
1612010
Correlating cellulose nanocrystal particle size and surface area
A Brinkmann, M Chen, M Couillard, ZJ Jakubek, T Leng, LJ Johnston
Langmuir 32 (24), 6105-6114, 2016
1302016
Scanning-helium-ion-beam lithography with hydrogen silsesquioxane resist
D Winston, BM Cord, B Ming, DC Bell, WF DiNatale, LA Stern, AE Vladar, ...
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2009
1292009
Particle size distributions by transmission electron microscopy: an interlaboratory comparison case study
SB Rice, C Chan, SC Brown, P Eschbach, L Han, DS Ensor, AB Stefaniak, ...
Metrologia 50 (6), 663, 2013
1182013
Determination of optimal parameters for CD-SEM measurement of line-edge roughness
BD Bunday, M Bishop, DW McCormack Jr, JS Villarrubia, AE Vladar, ...
Metrology, Inspection, and Process Control for Microlithography XVIII 5375 …, 2004
1072004
Scanning electron microscope measurement of width and shape of 10 nm patterned lines using a JMONSEL-modeled library
JS Villarrubia, AE Vladár, B Ming, RJ Kline, DF Sunday, JS Chawla, S List
Ultramicroscopy 154, 15-28, 2015
962015
Scanning electron microscope analog of scatterometry
JS Villarrubia, AE Vladar, JR Lowney, MT Postek Jr
Metrology, Inspection, and Process Control for Microlithography XVI 4689 …, 2002
962002
Scanning electron microscope analog of scatterometry
JS Villarrubia, AE Vladar, JR Lowney, MT Postek Jr
Metrology, Inspection, and Process Control for Microlithography XVI 4689 …, 2002
962002
Scanning electron microscope dimensional metrology using a model‐based library
JS Villarrubia, AE Vladár, MT Postek
Surface and Interface Analysis: An International Journal devoted to the …, 2005
922005
In-line E-beam wafer metrology and defect inspection: the end of an era for image-based critical dimensional metrology? New life for defect inspection
E Solecky, OD Patterson, A Stamper, E McLellan, R Buengener, A Vaid, ...
Metrology, Inspection, and Process Control for Microlithography XXVII 8681 …, 2013
852013
Silicon nanostructures fabricated by scanning probe oxidation and tetra-methyl ammonium hydroxide etching
FSS Chien, WF Hsieh, S Gwo, AE Vladar, JA Dagata
Journal of Applied Physics 91 (12), 10044-10050, 2002
822002
Image sharpness measurement in the scanning electron microscope—Part III
NF Zhang, MT Postek, RD Larrabee, AE Vladár, WJ Keery, SN Jones
Scanning 21 (4), 246-252, 1999
771999
Nanostructure fabrication by ultra-high-resolution environmental scanning electron microscopy
M Toth, CJ Lobo, WR Knowles, MR Phillips, MT Postek, AE Vladár
Nano letters 7 (2), 525-530, 2007
762007
Simulation study of repeatability and bias in the CD-SEM
JS Villarrubia, AE Vladar, MT Postek
Metrology, Inspection, and Process Control for Microlithography XVII 5038 …, 2003
752003
Simulation study of repeatability and bias in the CD-SEM
JS Villarrubia, AE Vladar, MT Postek
Metrology, Inspection, and Process Control for Microlithography XVII 5038 …, 2003
752003
Simulation study of repeatability and bias in the CD-SEM
JS Villarrubia, AE Vladar, MT Postek
Metrology, Inspection, and Process Control for Microlithography XVII 5038 …, 2003
752003
A tumor-targeted nanodelivery system to improve early MRI detection of cancer
KF Pirollo, J Dagata, P Wang, M Freedman, A Vladar, S Fricke, L Ileva, ...
Molecular Imaging 5 (1), 7290.2006. 00005, 2006
712006
A kurtosis-based statistical measure for two-dimensional processes and its applications to image sharpness
NF Zhang, A Vladar, MT Postek, RD Larrabee
702003
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