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Dimitrios S. Mataras
Dimitrios S. Mataras
Department of Chemical Engineering, University of Patras Greece
Verified email at upatras.gr - Homepage
Title
Cited by
Cited by
Year
Power dissipation and impedance measurements in radio‐frequency discharges
N Spiliopoulos, D Mataras, DE Rapakoulias
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 14 (5 …, 1996
1351996
Frequency variation under constant power conditions in hydrogen radio frequency discharges
E Amanatides, D Mataras
Journal of Applied Physics 89 (3), 1556-1566, 2001
962001
Spatial profiles of reactive intermediates in rf silane discharges
D Mataras, S Cavadias, D Rapakoulias
Journal of applied physics 66 (1), 119-124, 1989
821989
Gas phase and surface kinetics in plasma enhanced chemical vapor deposition of microcrystalline silicon: The combined effect of rf power and hydrogen dilution
E Amanatides, S Stamou, D Mataras
Journal of Applied Physics 90 (11), 5786-5798, 2001
802001
High pressure regime of plasma enhanced deposition of microcrystalline silicon
E Amanatides, A Hammad, E Katsia, D Mataras
Journal of applied physics 97 (7), 073303, 2005
752005
Improved surface energy analysis for plasma treated PET films
D Papakonstantinou, E Amanatides, D Mataras, V Ioannidis, ...
Plasma Processes and Polymers 4 (S1), S1057-S1062, 2007
692007
Staphylococcus epidermidis adhesion to He, He/O2 plasma treated PET films and aged materials: Contributions of surface free energy and shear rate
M Katsikogianni, E Amanatides, D Mataras, YF Missirlis
Colloids and Surfaces B: Biointerfaces 65 (2), 257-268, 2008
552008
Effect of frequency in the deposition of microcrystalline silicon from silane discharges
E Amanatides, D Mataras, DE Rapakoulias
Journal of Applied Physics 90 (11), 5799-5807, 2001
512001
Plasma surface treatment of polyethylene terephthalate films for bacterial repellence
E Amanatides, D Mataras, M Katsikogianni, YF Missirlis
Surface and Coatings Technology 200 (22-23), 6331-6335, 2006
472006
Covalent immobilization of liposomes on plasma functionalized metallic surfaces
S Mourtas, M Kastellorizios, P Klepetsanis, E Farsari, E Amanatides, ...
Colloids and Surfaces B: Biointerfaces 84 (1), 214-220, 2011
392011
RF power effect on TEOS/O2 PECVD of silicon oxide thin films
C Voulgaris, A Panou, E Amanatides, D Mataras
Surface and Coatings Technology 200 (1-4), 351-354, 2005
332005
Deposition rate optimization in SiH4/H2 PECVD of hydrogenated microcrystalline silicon
E Amanatides, D Mataras, DE Rapakoulias
Thin Solid Films 383 (1-2), 15-18, 2001
332001
Plasma emission diagnostics for the transition from microcrystalline to amorphous silicon solar cells
E Amanatides, D Mataras, D Rapakoulias, MN Van den Donker, B Rech
Solar energy materials and solar cells 87 (1-4), 795-805, 2005
312005
Kinetics of power deposition and silane dissociation in Radio‐Frequency discharges
N Spiliopoulos, D Mataras, DE Rapakoulias
Journal of The Electrochemical Society 144 (2), 634, 1997
311997
RF power and SiOxCyHz deposition efficiency in TEOS/O2 discharges for the corrosion protection of magnesium alloys
C Voulgaris, E Amanatides, D Mataras, S Grassini, E Angelini, ...
Surface and Coatings Technology 200 (22-23), 6618-6622, 2006
252006
Power dissipation mechanisms in radio‐frequency driven silane discharges: The influence of discharge geometry
D Mataras, S Cavadias, D Rapakoulias
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 11 (3 …, 1993
251993
A hybrid kinetic Monte Carlo method for simulating silicon films grown by plasma-enhanced chemical vapor deposition.
DM D G Tsalikis, C Baig, V G Mavrantzas, E Amanatides
The Journal of chemical physics 139 (20), 204706, 2013
242013
Total SiH4/H2 pressure effect on microcrystalline silicon thin films growth and structure
E Katsia, E Amanatides, D Mataras, Α Soto, GA Voyiatzis
Solar energy materials and solar cells 87 (1-4), 157-167, 2005
232005
Simulation of the SiH (A2Δ→ X 2Π) emission spectrum in a silane glow discharge and derivation of an improved set of molecular constants
S Stamou, D Mataras, D Rapakoulias
Chemical physics 218 (1-2), 57-69, 1997
211997
Influence of plasma conditions on the defect formation mechanism in amorphous hydrogenated silicon
P Kounavis, D Mataras, N Spiliopoulos, E Mytilineou, D Rapakoulias
Journal of applied physics 75 (3), 1599-1606, 1994
211994
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