| Plasma enhanced ALD system M Sowa, R Kane, M Sershen US Patent 10,351,950, 2019 | 318 | 2019 |
| Radical-enhanced atomic layer deposition using CF4 to enhance oxygen radical generation AW Zafiropoulo, MJ Sowa US Patent 9,318,319, 2016 | 236 | 2016 |
| Helicon plasma source excited by a flat spiral coil JE Stevens, MJ Sowa, JL Cecchi Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 13 (5 …, 1995 | 84 | 1995 |
| Fluorocarbon polymer deposition kinetics in a low-pressure, high-density, inductively coupled plasma reactor MJ Sowa, ME Littau, V Pohray, JL Cecchi Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 18 (5 …, 2000 | 54 | 2000 |
| Uniformity of radio frequency bias voltages along conducting surfaces in a plasma JE Stevens, MJ Sowa, JL Cecchi Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 14 (1 …, 1996 | 29 | 1996 |
| Plasma-enhanced atomic layer deposition of superconducting niobium nitride MJ Sowa, Y Yemane, J Zhang, JC Palmstrom, L Ju, NC Strandwitz, ... Journal of Vacuum Science & Technology A 35 (1), 2017 | 27 | 2017 |
| Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition YT Yemane, MJ Sowa, J Zhang, L Ju, EW Deguns, NC Strandwitz, ... Superconductor Science and Technology 30 (9), 095010, 2017 | 22 | 2017 |
| Plasma-enhanced atomic layer deposition of titanium vanadium nitride MJ Sowa, L Ju, AC Kozen, NC Strandwitz, G Zeng, TF Babuska, Z Hsain, ... Journal of Vacuum Science & Technology A 36 (6), 2018 | 13 | 2018 |
| Role of plasma enhanced atomic layer deposition reactor wall conditions on radical and ion substrate fluxes MJ Sowa Journal of Vacuum Science & Technology A 32 (1), 2014 | 13 | 2014 |
| Improved through silicon via M Sowa US Patent App. 15/323,805, 2017 | 12 | 2017 |
| Pt thermal atomic layer deposition for silicon x-ray micropore optics K Takeuchi, Y Ezoe, K Ishikawa, M Numazawa, M Terada, D Ishi, ... Applied Optics 57 (12), 3237-3243, 2018 | 11 | 2018 |
| Enhanced X-ray reflectivity from Pt-coated silicon micropore optics prepared by plasma atomic layer deposition D Ishi, Y Ezoe, K Ishikawa, M Numazawa, A Fukushima, R Otsubo, ... Applied Physics Express 13 (8), 087001, 2020 | 9 | 2020 |
| Plasma-enhanced atomic layer deposition of vanadium nitride AC Kozen, MJ Sowa, L Ju, NC Strandwitz, G Zeng, TF Babuska, Z Hsain, ... Journal of Vacuum Science & Technology A 37 (6), 2019 | 9 | 2019 |
| Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions MI Chowdhury, M Sowa, AC Kozen, BA Krick, J Haik, TF Babuska, ... Journal of Vacuum Science & Technology A 39 (1), 2021 | 8 | 2021 |
| Effects of deposition temperature on the wear behavior and material properties of plasma enhanced atomic layer deposition (PEALD) titanium vanadium nitride thin films KE Van Meter, MI Chowdhury, MJ Sowa, AC Kozen, T Grejtak, ... Wear 523, 204731, 2023 | 6 | 2023 |
| Plasma-enhanced atomic layer deposition of tungsten nitride MJ Sowa, Y Yemane, FB Prinz, J Provine Journal of Vacuum Science & Technology A 34 (5), 2016 | 6 | 2016 |
| Plasma-Enabled ALD of niobium nitride using an organometallic Nb precursor E Deguns, MJ Sowa, MJ Dalberth, R Bhatia, R Kanjolia, D Moser, ... ECS Transactions 33 (2), 177, 2010 | 6 | 2010 |
| Diode laser measurements of species in a low-pressure, high-density plasma reactor ME Littau, MJ Sowa, JL Cecchi Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 20 (5 …, 2002 | 5 | 2002 |
| Thin films for 3D: ALD for non-planar topographies GM Sundaram, EW Deguns, R Bhatia, MJ Dalberth, M Sowa, JS Becker Solid State Technology 52 (6), 12-17, 2009 | 4 | 2009 |
| Spatially resolved electron temperature measurements with a microfabricated retarding field analyzer MJ Sowa, MG Blain, RL Jarecki, JE Stevens Applied physics letters 80 (6), 932-934, 2002 | 4 | 2002 |
