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Jingyun Zhang
Jingyun Zhang
IBM Research
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Year
Stacked nanosheet gate-all-around transistor to enable scaling beyond FinFET
N Loubet, T Hook, P Montanini, CW Yeung, S Kanakasabapathy, ...
2017 symposium on VLSI technology, T230-T231, 2017
7932017
Field-Effect Transistors With Graphene/Metal Heterocontacts
Y Du, L Yang, J Zhang, H Liu, K Majumdar, PD Kirsch, DY Peide
IEEE electron device letters 35 (5), 599-601, 2014
1732014
Directed self-assembly of block copolymers for 7 nanometre FinFET technology and beyond
CC Liu, E Franke, Y Mignot, R Xie, CW Yeung, J Zhang, C Chi, C Zhang, ...
Nature Electronics 1 (10), 562-569, 2018
1042018
Heteroepitaxy of La2O3 and La2–xYxO3 on GaAs (111)A by Atomic Layer Deposition: Achieving Low Interface Trap Density
X Wang, L Dong, J Zhang, Y Liu, PD Ye, RG Gordon
Nano letters 13 (2), 594-599, 2013
982013
Channel geometry impact and narrow sheet effect of stacked nanosheet
CW Yeung, J Zhang, R Chao, O Kwon, R Vega, G Tsutsui, X Miao, ...
2018 IEEE international electron devices meeting (IEDM), 28.6. 1-28.6. 4, 2018
782018
A Novel Dry Selective Etch of SiGe for the Enablement of High Performance Logic Stacked Gate-All-Around NanoSheet Devices
IEEE International Electron Devices Meeting (IEDM), pp. 11.4.1-11.4.4, 2019
712019
Full bottom dielectric isolation to enable stacked nanosheet transistor for low power and high performance applications
J Zhang, J Frougier, A Greene, X Miao, L Yu, R Vega, P Montanini, ...
2019 IEEE International Electron Devices Meeting (IEDM), 11.6. 1-11.6. 4, 2019
672019
High-k metal gate fundamental learning and multi-Vt options for stacked nanosheet gate-all-around transistor
J Zhang, T Ando, CW Yeung, M Wang, O Kwon, R Galatage, R Chao, ...
2017 IEEE International Electron Devices Meeting (IEDM), 22.1. 1-22.1. 4, 2017
602017
Air spacer for 10nm FinFET CMOS and beyond
K Cheng, C Park, C Yeung, S Nguyen, J Zhang, X Miao, M Wang, ...
2016 IEEE International Electron Devices Meeting (IEDM), 17.1. 1-17.1. 4, 2016
532016
Vertically stacked nFET and pFET with dual work function
A Reznicek, T Ando, J Zhang, CH Lee, P Hashemi
US Patent 10,546,925, 2020
462020
Low-frequency noise and random telegraph noise on near-ballistic III-V MOSFETs
M Si, NJ Conrad, S Shin, J Gu, J Zhang, MA Alam, DY Peide
IEEE Transactions on Electron Devices 62 (11), 3508-3515, 2015
442015
Full air-gap spacers for gate-all-around nanosheet field effect transistors
T Ando, P Hashemi, CH Lee, A Reznicek, J Zhang
US Patent 10,553,696, 2020
412020
First experimental demonstration of Ge 3D FinFET CMOS circuits
H Wu, W Luo, H Zhou, M Si, J Zhang, DY Peide
2015 Symposium on VLSI Technology (VLSI Technology), T58-T59, 2015
412015
Formation of self-limited inner spacer for gate-all-around nanosheet FET
J Zhang, T Ando, CH Lee, A Reznicek, P Hashemi
US Patent 10,553,679, 2020
392020
Germanium nMOSFETs with recessed channel and S/D: Contact, scalability, interface, and drain current exceeding 1 A/mm
H Wu, M Si, L Dong, J Gu, J Zhang, DY Peide
IEEE Transactions on Electron Devices 62 (5), 1419-1426, 2015
372015
Vertically stacked NFETS and PFETS with gate-all-around structure
J Zhang, T Ando, P Hashemi, CH Lee, A Reznicek
US Patent 10,381,438, 2019
312019
Multiple-Vt solutions in nanosheet technology for high performance and low power applications
R Bao, K Watanabe, J Zhang, J Guo, H Zhou, A Gaul, M Sankarapandian, ...
2019 IEEE International Electron Devices Meeting (IEDM), 11.2. 1-11.2. 4, 2019
292019
Vertically stacked dual channel nanosheet devices
CH Lee, J Zhang, P Hashemi, T Ando, A Reznicek
US Patent 10,553,678, 2020
282020
Ge CMOS: Breakthroughs of nFETs (Imax=714 mA/mm, gmax=590 mS/mm) by recessed channel and S/D
H Wu, M Si, L Dong, J Zhang, DY Peide
2014 Symposium on VLSI Technology (VLSI-Technology): Digest of Technical …, 2014
282014
Gate-all-around field-effect transistor with asymmetric threshold voltage
J Zhang, CH Lee, T Ando, P Hashemi, A Reznicek
US Patent App. 16/147,680, 2020
242020
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