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Raghavan Nagarajan
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Year
Resistive switching: from fundamentals of nanoionic redox processes to memristive device applications
D Ielmini, R Waser
John Wiley & Sons, 2015
4912015
Recommended methods to study resistive switching devices
M Lanza, HSP Wong, E Pop, D Ielmini, D Strukov, BC Regan, L Larcher, ...
Advanced Electronic Materials 5 (1), 1800143, 2019
4732019
Intrinsic switching variability in HfO2RRAM
A Fantini, L Goux, R Degraeve, DJ Wouters, N Raghavan, G Kar, ...
2013 5th IEEE International Memory Workshop, 30-33, 2013
2302013
Improvement of data retention in HfO2/Hf 1T1R RRAM cell under low operating current
YY Chen, M Komura, R Degraeve, B Govoreanu, L Goux, A Fantini, ...
2013 IEEE International Electron Devices Meeting, 10.1. 1-10.1. 4, 2013
1282013
A framework to practical predictive maintenance modeling for multi-state systems
CM Tan, N Raghavan
Reliability Engineering & System Safety 93 (8), 1138-1150, 2008
1082008
Causes and consequences of the stochastic aspect of filamentary RRAM
R Degraeve, A Fantini, N Raghavan, L Goux, S Clima, B Govoreanu, ...
Microelectronic Engineering 147, 171-175, 2015
962015
Standards for the characterization of endurance in resistive switching devices
M Lanza, R Waser, D Ielmini, JJ Yang, L Goux, J Suņe, AJ Kenyon, ...
ACS nano 15 (11), 17214-17231, 2021
832021
Intrinsic nanofilamentation in resistive switching
X Wu, D Cha, M Bosman, N Raghavan, DB Migas, VE Borisenko, ...
Journal of Applied Physics 113 (11), 114503, 2013
832013
Heuristic Kalman optimized particle filter for remaining useful life prediction of lithium-ion battery
PLT Duong, N Raghavan
Microelectronics Reliability 81, 232-243, 2018
812018
Microscopic origin of random telegraph noise fluctuations in aggressively scaled RRAM and its impact on read disturb variability
N Raghavan, R Degraeve, A Fantini, L Goux, S Strangio, B Govoreanu, ...
2013 IEEE International Reliability Physics Symposium (IRPS), 5E. 3.1-5E. 3.7, 2013
732013
Stochastic variability of vacancy filament configuration in ultra-thin dielectric RRAM and its impact on OFF-state reliability
N Raghavan, R Degraeve, A Fantini, L Goux, DJ Wouters, ...
2013 IEEE International Electron Devices Meeting, 21.1. 1-21.1. 4, 2013
622013
Data-driven design space exploration and exploitation for design for additive manufacturing
Y Xiong, PLT Duong, D Wang, SI Park, Q Ge, N Raghavan, DW Rosen
Journal of Mechanical Design 141 (10), 2019
612019
Conductive atomic force microscope study of bipolar and threshold resistive switching in 2D hexagonal boron nitride films
A Ranjan, N Raghavan, SJ O’shea, S Mei, M Bosman, K Shubhakar, ...
Scientific reports 8 (1), 1-9, 2018
582018
Nanostructure and nanomaterial characterization, growth mechanisms, and applications
CI Ossai, N Raghavan
Nanotechnology Reviews 7 (2), 209-231, 2018
512018
Evidence for compliance controlled oxygen vacancy and metal filament based resistive switching mechanisms in RRAM
N Raghavan, KL Pey, W Liu, X Wu, X Li, M Bosman
Microelectronic Engineering 88 (7), 1124-1128, 2011
512011
Study of preferential localized degradation and breakdown of HfO2/SiOx dielectric stacks at grain boundary sites of polycrystalline HfO2 dielectrics
K Shubhakar, KL Pey, N Raghavan, SS Kushvaha, M Bosman, Z Wang, ...
Microelectronic engineering 109, 364-369, 2013
502013
Evolution of Filament Formation in Ni/HfO2/SiOx/Si‐Based RRAM Devices
X Wu, S Mei, M Bosman, N Raghavan, X Zhang, D Cha, K Li, KL Pey
Advanced Electronic Materials 1 (11), 1500130, 2015
492015
Hourglass concept for RRAM: a dynamic and statistical device model
R Degraeve, A Fantini, N Raghavan, L Goux, S Clima, YY Chen, ...
Proceedings of the 21th International Symposium on the Physical and Failure …, 2014
492014
RTN insight to filamentary instability and disturb immunity in ultra-low power switching HfOx and AlOx RRAM
N Raghavan, R Degraeve, L Goux, A Fantini, DJ Wouters, ...
2013 Symposium on VLSI Technology, T164-T165, 2013
482013
Role of oxygen vacancies in -based gate stack breakdown
X Wu, DB Migas, X Li, M Bosman, N Raghavan, VE Borisenko, KL Pey
Applied Physics Letters 96 (17), 172901, 2010
482010
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