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Chris M. Fancher
Chris M. Fancher
Material Science and Technology Division, Oak Ridge National Lab
Verified email at ornl.gov
Title
Cited by
Cited by
Year
A comprehensive study on the structural evolution of HfO 2 thin films doped with various dopants
MH Park, T Schenk, CM Fancher, ED Grimley, C Zhou, C Richter, ...
Journal of Materials Chemistry C 5 (19), 4677-4690, 2017
2052017
Breaking of macroscopic centric symmetry in paraelectric phases of ferroelectric materials and implications for flexoelectricity
A Biancoli, CM Fancher, JL Jones, D Damjanovic
Nature materials 14 (2), 224-229, 2015
1742015
TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
PD Lomenzo, Q Takmeel, C Zhou, CM Fancher, E Lambers, ...
Journal of Applied Physics 117 (13), 134105, 2015
1392015
Si doped hafnium oxide—A “fragile” ferroelectric system
C Richter, T Schenk, MH Park, FA Tscharntke, ED Grimley, JM LeBeau, ...
Advanced Electronic Materials 3 (10), 1700131, 2017
1172017
Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
PD Lomenzo, P Zhao, Q Takmeel, S Moghaddam, T Nishida, M Nelson, ...
Journal of Vacuum Science & Technology B, Nanotechnology and …, 2014
1052014
The effects of layering in ferroelectric Si-doped HfO2 thin films
PD Lomenzo, Q Takmeel, C Zhou, Y Liu, CM Fancher, JL Jones, ...
Applied Physics Letters 105 (7), 072906, 2014
582014
Ferroelectric Si-Doped HfO2 Device Properties on Highly Doped Germanium
PD Lomenzo, Q Takmeel, CM Fancher, C Zhou, NG Rudawski, ...
IEEE Electron Device Letters 36 (8), 766-768, 2015
552015
On the Origin of the Large Remanent Polarization in La:HfO2
T Schenk, CM Fancher, MH Park, C Richter, C Künneth, A Kersch, ...
Advanced Electronic Materials 5 (12), 1900303, 2019
512019
The contribution of 180 domain wall motion to dielectric properties quantified from in situ X-ray diffraction
CM Fancher, S Brewer, CC Chung, S Röhrig, T Rojac, G Esteves, ...
Acta Materialia 126, 36-43, 2017
422017
In situ measurement of increased ferroelectric/ferroelastic domain wall motion in declamped tetragonal lead zirconate titanate thin films
M Wallace, RL Johnson-Wilke, G Esteves, CM Fancher, RHT Wilke, ...
Journal of Applied Physics 117 (5), 054103, 2015
422015
Accurate nanoscale crystallography in real-space using scanning transmission electron microscopy
JH Dycus, JS Harris, X Sang, CM Fancher, SD Findlay, AA Oni, ...
Microscopy and Microanalysis 21 (4), 946-952, 2015
412015
Effect of Texture on Temperature‐Dependent Properties of K0.5Na0.5NbO3 Modified Bi1/2Na1/2TiO3xBaTiO3
CM Fancher, W Jo, J Rödel, JE Blendell, KJ Bowman
Journal of the American Ceramic Society 97 (8), 2557-2563, 2014
392014
In situ characterization of polycrystalline ferroelectrics using x-ray and neutron diffraction
G Esteves, CM Fancher, JL Jones
Journal of Materials Research 30 (3), 340-356, 2015
382015
Anomalous reduction in domain wall displacement at the morphotropic phase boundary of the piezoelectric alloy system PbTi O 3− BiSc O 3
DK Khatua, CM Fancher, JL Jones, R Ranjan
Physical Review B 93 (10), 104103, 2016
312016
Electric-field-induced structural changes in multilayer piezoelectric actuators during electrical and mechanical loading
G Esteves, CM Fancher, S Röhrig, GA Maier, JL Jones, M Deluca
Acta Materialia 132, 96-105, 2017
282017
Use of Bayesian inference in crystallographic structure refinement via full diffraction profile analysis
CM Fancher, Z Han, I Levin, K Page, BJ Reich, RC Smith, AG Wilson, ...
Scientific reports 6 (1), 1-12, 2016
282016
Poling effect on d33 in textured Bi0. 5Na0. 5TiO3-based materials
CM Fancher, JE Blendell, KJ Bowman
Scripta Materialia 68 (7), 443-446, 2013
282013
LIPRAS: Line-profile analysis software
G Esteves, K Ramos, CM Fancher, JL Jones
Preprint at https://www. researchgate. net/publication/316985889_LIPRAS_Line …, 2017
242017
Controlling the extent of atomic ordering in intermetallic alloys through additive manufacturing
AB Kustas, CM Fancher, SR Whetten, DJ Dagel, JR Michael, DF Susan
Additive Manufacturing 28, 772-780, 2019
222019
Crystal structure of Si-doped HfO2
L Zhao, M Nelson, H Aldridge, T Iamsasri, CM Fancher, JS Forrester, ...
Journal of Applied Physics 115 (3), 034104, 2014
222014
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