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Antoine Pacco
Antoine Pacco
Verified email at imec.be
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Cited by
Cited by
Year
Investigation of Microwave Loss Induced by Oxide Regrowth in High-Q Niobium Resonators
J Verjauw, A Potočnik, M Mongillo, R Acharya, F Mohiyaddin, G Simion, ...
Physical Review Applied 16 (1), 014018, 2021
722021
Pentacopper (II) complexes of α-aminohydroxamic acids: uranyl-induced conversion of a 12-metallacrown-4 to a 15-metallacrown-5
TN Parac-Vogt, A Pacco, C Görller-Walrand, K Binnemans
Journal of inorganic biochemistry 99 (2), 497-504, 2005
592005
Relaxometric Study of Copper [15] Metallacrown‐5 Gadolinium Complexes Derived from α‐Aminohydroxamic Acids
TN Parac‐Vogt, A Pacco, P Nockemann, S Laurent, RN Muller, ...
Chemistry–A European Journal 12 (1), 204-210, 2006
492006
Nanoparticle removal with megasonics: a review
S Brems, M Hauptmann, E Camerotto, A Pacco, TG Kim, X Xu, K Wostyn, ...
ECS Journal of Solid State Science and Technology 3 (1), N3010, 2013
452013
Selective wet etching of silicon germanium in composite vertical nanowires
Z Baraissov, A Pacco, S Koneti, G Bisht, F Panciera, F Holsteyns, ...
ACS applied materials & interfaces 11 (40), 36839-36846, 2019
292019
Non-destructive characterization of extended crystalline defects in confined semiconductor device structures
A Schulze, L Strakos, T Vystavel, R Loo, A Pacco, N Collaert, ...
Nanoscale 10 (15), 7058-7066, 2018
272018
Low temperature pre-epi treatment: critical parameters to control interface contamination
R Loo, A Hikavyy, FE Leys, M Wada, K Sano, B De Vos, A Pacco, ...
Solid state phenomena 145, 177-180, 2009
272009
Influence of surface tension on cavitation noise spectra and particle removal efficiency in high frequency ultrasound fields
E Camerotto, S Brems, M Hauptmann, A Pacco, H Struyf, PW Mertens, ...
Journal of Applied Physics 112 (11), 2012
262012
Lanthanide(III)‐Induced Conversion of 12‐Metallacrown‐4 to 5‐Metallacrown‐5 Complexes in Solution
A Pacco, TN Parac‐Vogt, E van Besien, K Pierloot, C Görller‐Walrand, ...
European journal of inorganic chemistry 2005 (16), 3303-3310, 2005
262005
Mandelohydroxamic Acid as Ligand for Copper(II) 15‐Metallacrown‐5 Lanthanide(III) and Copper(II) 15‐Metallacrown‐5 Uranyl Complexes
TN Parac‐Vogt, A Pacco, P Nockemann, YF Yuan, C Görller‐Walrand, ...
European journal of inorganic chemistry 2006 (7), 1466-1474, 2006
252006
Controlled cobalt recess for advanced interconnect metallization
A Pacco, Y Akanishi, QT Le, E Kesters, G Murdoch, F Holsteyns
Microelectronic Engineering 217, 111131, 2019
242019
The influence of dissolved carbon dioxide on cavitation intensity in ultrasound cleaning systems
S Brems, M Hauptmann, E Camerotto, A Pacco, H Struyf, P Mertens, ...
Japanese journal of applied physics 52 (6R), 066602, 2013
192013
Copper (II) 15-metallacrown-5 lanthanide (III) complexes derived from l-serine and l-threonine hydroxamic acids
A Pacco, G Absillis, K Binnemans, TN Parac-Vogt
Journal of alloys and compounds 451 (1-2), 38-41, 2008
132008
Effects of interfacial strength and dimension of structures on physical cleaning window
TG Kim, A Pacco, K Wostyn, S Brems, XM Xu, H Struyf, K Arstila, ...
Solid State Phenomena 187, 123-126, 2012
112012
Buried power rail metal exploration towards the 1 nm node
A Gupta, D Radisic, JW Maes, OV Pedreira, JP Soulié, N Jourdan, ...
2021 IEEE International Electron Devices Meeting (IEDM), 22.5. 1-22.5. 4, 2021
102021
Drying of high aspect ratio structures: a comparison of drying techniques via electrical stiction analysis
A Pacco, M Wada, T Bearda, PW Mertens
Solid State Phenomena 145, 87-90, 2009
102009
Fabrication and room temperature characterization of trilayer junctions for the development of superconducting qubits on 300 mm wafers
D Wan, S Couet, X Piao, L Souriau, Y Canvel, D Tsvetanova, ...
Japanese Journal of Applied Physics 60 (SB), SBBI04, 2021
92021
Controlling the wet-etch directionality in nanostructured silicon
Z Aabdin, T Ghosh, A Pacco, S Raj, HTB Do, K Saidov, TW Weei, ...
ACS Applied Electronic Materials 4 (11), 5191-5198, 2022
82022
Towards reduced impact of EUV mask defectivity on wafer
R Jonckheere, D Van den Heuvel, A Pacco, I Pollentier, B Baudemprez, ...
Photomask and Next-Generation Lithography Mask Technology XXI 9256, 167-174, 2014
82014
Method for Reducing the Damage Induced by a Physical Force Assisted Cleaning
P Mertens, S Halder, A Pacco, T Janssens
US Patent App. 12/718,732, 2010
82010
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